Semiconductor package and method for fabricating base for semiconductor package

ABSTRACT

The invention provides a semiconductor package and a method for fabricating a base for a semiconductor package. The semiconductor package includes a base. The base has a device-attach surface. A radio-frequency (RF) device is embedded in the base. The RF device is close to the device-attach surface.

BACKGROUND OF THE INVENTION Field of the Invention

The present invention relates to a semiconductor package and a methodfor fabricating a base for a semiconductor package, and in particular,to a base with a radio-frequency (RF) device embedded therein for asemiconductor package.

Description of the Related Art

In high-speed applications (e.g. radio-frequency (RF) applications), theconventional RF device comprises several discrete RF chips and otheractive or passive devices (such as inductors, antennas, filters, poweramplifiers (PAs), decoupling or matching circuits) mounted on an RF maindie. However, the on-wafer inductors of the conventional RF device areformed of aluminum (Al), and the thickness of the on-wafer inductors islimited by the fabrication processes of the conventional RF device.Therefore, inductors of the conventional RF device, also referred to ason-wafer inductors, suffer from large area consumption and a low qualityfactor (Q-factor). Also, the size of the RF main die and the number ofdie-per-wafer of the conventional RF device cannot be reduced.

Thus, a novel RF device package is desirable.

BRIEF SUMMARY OF INVENTION

A semiconductor package and a method for fabricating a base for asemiconductor package are provided. An exemplary embodiment of asemiconductor package includes a base having a device-attach surface. Aradio-frequency (RF) device is embedded in the base, close to thedevice-attach surface.

Another exemplary embodiment of a semiconductor package includes aradio-frequency (RF) device, having a bottom surface and a sidewallconnected to a base. A semiconductor device is mounted on the RF devicevia a conductive structure.

An exemplary embodiment of a method for fabricating a base for asemiconductor package includes providing a carrier with conductive seedlayers on the top surface and the bottom surface of the carrier.Radio-frequency (RF) devices are respectively formed on the conductiveseed layers. A first base material layer and a second base materiallayer are respectively laminated on the conductive seed layers, coveringthe RF devices. The first base material layer and the second basematerial layer, which contain the RF devices thereon, are separated fromthe carrier to form a first base and a second base.

Another exemplary embodiment of a method for fabricating a semiconductorpackage includes providing a base. At least one radio-frequency (RF)device is formed on the base. An additional insulation material isformed on the base, and further defining patterns upon the additionalinsulation material, wherein the pattern is formed on the RF device(s).

A detailed description is given in the following embodiments withreference to the accompanying drawings.

BRIEF DESCRIPTION OF DRAWINGS

The invention can be more fully understood by reading the subsequentdetailed description and examples with references made to theaccompanying drawings, wherein:

FIG. 1 is a top view showing one exemplary embodiment of a semiconductorpackage, especially showing a base with a radio-frequency (RF) deviceembedded therein for a semiconductor package.

FIG. 2 is a partial cross section taken along a line A-A′ of FIG. 1,showing one exemplary embodiment of a semiconductor package, especiallyshowing a base with a radio-frequency (RF) device embedded therein for asemiconductor package.

FIG. 3 shows a partial cross section taken showing another exemplaryembodiment of a semiconductor package of the invention, especiallyshowing a base with a radio-frequency (RF) device embedded therein for asemiconductor package.

FIGS. 4A to 4E are cross sections showing one exemplary embodiment of amethod for fabricating a base with an RF device for a semiconductorpackage of the invention.

DETAILED DESCRIPTION OF INVENTION

The following description is a mode for carrying out the invention. Thisdescription is made for the purpose of illustrating the generalprinciples of the invention and should not be taken in a limiting sense.The scope of the invention is best determined by reference to theappended claims. Wherever possible, the same reference numbers are usedin the drawings and the descriptions to refer the same or like parts.

The present invention will be described with respect to particularembodiments and with reference to certain drawings, but the invention isnot limited thereto and is only limited by the claims. The drawingsdescribed are only schematic and are non-limiting. In the drawings, thesize of some of the elements may be exaggerated and not drawn to scalefor illustrative purposes. The dimensions and the relative dimensions donot correspond to actual dimensions to practice of the invention.

FIG. 1 is a top view showing one exemplary embodiment of a semiconductorpackage 500 a, especially showing a base with a radio-frequency (RF)device embedded therein for a semiconductor package. In this embodiment,the semiconductor package can be a flip chip package using conductivestructures, for example, copper pillar bumps, connecting a semiconductordevice to a base. Alternatively, the semiconductor package can be apackage using wire bonding technology to connect a semiconductor deviceto a base. FIG. 2 shows a partial cross section taken along a line A-A′of FIG. 1, showing one exemplary embodiment of a semiconductor package500 a of the invention. Please refer to FIGS. 1 and 2, wherein thesemiconductor package 500 a comprises a base 200 having a device-attachsurface 214 and a solder-ball-attach surface 213 opposite to thedevice-attach surface 214. In one embodiment, the base 200, for example,a printed circuit board (PCB), may be formed of polypropylene (PP). Itshould also be noted that the base 200 can be a single layer or amultilayer structure. In this embodiment, a radio-frequency (RF) device240 is formed embedded in the base 200, close to the device-attachsurface 214. In one embodiment, the RF device 240 may comprise aninductor, antenna, filter, power amplifiers (PAs), decoupling ormatching circuits. In this embodiment, the RF device 240 is an inductor240. In this embodiment, the RF device 240 has two terminal portions 248and 250 serving as pad regions 248 and 250 to connect to a semiconductordevice 300 mounted directly onto the base 200. In this embodiment, theRF device 240 has a plurality of device portions, for example, deviceportions 240-1 and 240-2. The device portions 240-1 and 240-2 of the RFdevice 240 may be designed to have a width W1 which is larger than 5 μm,and a minimum spacing S1 which is about 10-12 μm. However, it should benoted that there is no limitation on the width W1 and the minimumspacing S1 of the device portions 240-1 and 240-2 of the RF device 240.

Alternatively, a plurality of first conductive traces 202 a may also bedesigned to be embedded in the base 200, close to the device-attachsurface 214. In one embodiment, the first conductive traces 202 a maycomprise signal trace segments or ground trace segments, which are usedfor input/output (I/O) connections of the semiconductor device 300mounted directly onto the base 200. Therefore, each of the firstconductive traces 202 a has a portion serving as a pad region of thebase 200. In this embodiment, the first conductive traces 202 a aredesigned to have a width W2 which is larger than 5 μm, and a minimumspacing S2 which is about 10-12 μm. However, it should be noted thatthere is no limitation on the width of the conductive traces. Fordifferent designs, the width of the conductive traces can be smallerthan 5 μm if required.

In one embodiment as shown in FIG. 2, a second conductive trace 202 bmay also be designed to be disposed on the solder-ball-attach surface213 of the base 200. In this embodiment, a solder-ball structure 252 mayalso be designed to be disposed on the second conductive trace 202 b.

A semiconductor device 300 is mounted on the device-attach surface 214of the base 200 with an active surface of the semiconductor device 300facing the base 200 by a bonding process. In one embodiment, thesemiconductor device 300 may comprise a die, a package, or a wafer-levelpackage. In this embodiment, the semiconductor device 300 is a flip chippackage. As shown in FIG. 2, the semiconductor device 300 may include abody 301, metal pads 304 overlying the semiconductor body 301, and aninsulation layer 302 covering the metal pads 304. The circuitry of thesemiconductor device 300 is disposed on the active surface, and themetal pads 304 are disposed on the top of the circuitry. The circuitryof the semiconductor device 300 is interconnected to the RF device 240and the first conductive traces 202 a embedded in the base 200 via aplurality of conductive structures 222 disposed on the active surface ofthe semiconductor device 300. However, it should be noted that theconductive structures 222 shown in FIG. 2 are only an example and is nota limitation to the present invention.

As shown in FIG. 2, the conductive structure 222 may comprise aconductive bump structure such as a copper bump or a solder bumpstructure, a conductive wire structure, or a conductive paste structure.In this embodiment, the conductive structure 222 may be a copper bumpstructure composed of a metal stack comprising a UBM (under-bumpmetallurgy) layer 306, a copper layer 216 such as a plated copper layer,a conductive buffer layer 218, and a solder cap 220. In one embodiment,the UBM layer 306 can be formed on the exposed metal pads 304 within theopenings by a deposition method such as a sputtering or plating methodand a subsequent anisotropic etching process. The anisotropic etchingprocess is performed after forming conductive pillars. The UBM layer 306may also extend onto a top surface of the insulation layer 302. In thisembodiment, the UBM layer 306 may comprise titanium, copper, or acombination thereof. A copper layer 216 such as an electroplated copperlayer can be formed on the UBM layer 306. The opening can be filled withthe copper layer 216 and the UBM layer 306, and the copper layer 216 andthe UBM layer 306 within the opening may form an integral plug of theconductive structure 222. The formation position of the copper layer 216is defined by a dry film photoresist or liquid photoresist patterns (notshown).

In one embodiment, an underfill material or the underfill 230 can beintroduced into the gap between the semiconductor device 300 and thebase 200. In one embodiment, the underfill 230 may comprise a capillaryunderfill (CUF), molded underfill (MUF), or a combination thereof.

In one embodiment, the RF device 240 and the first conductive traces 202a may have a top surface disposed above, below, or aligned to a surfaceof the base to improve routing ability for high-density semiconductorpackages. As shown in FIG. 2, the RF device 240 has a top surface 242 adisposed aligned to the device-attach surface 214 of the base 200. Thatis to say, the bottom surface 246 a and at least a sidewall 244 a of theRF device 240 are designed to be fully connected to the base 200.Alternatively, the first conductive traces 202 a may have a similararrangement to the RF device 240. For example, the first conductivetraces 202 a have top surfaces 212 a disposed aligned to thedevice-attach surface 214 of the base 200. Also, the bottom surface 206a and a sidewall 204 a of the conductive trace 202 a are designed to befully connected to the base 200. In this embodiment, the solder cap 220of the conductive structure 222 is disposed to contact with a portion ofthe base 200 and to connect to a top surface 242 a of the RF device 240and a top surface 212 a of the first conductive trace 202 a. Due to thetop surfaces of the RF device and the first conductive traces beingcoplanar to the device-attach surface 214 of the base 200, thebump-to-trace space is increased and the problem of bump-to-tracebridging can be effectively avoided.

FIG. 3 shows a partial cross section taken showing another exemplaryembodiment of a semiconductor package 500 b of the invention, especiallyshowing a base 200 a with a radio-frequency (RF) device embedded thereinfor a semiconductor package. Alternatively, the base 200 a may comprisea multilayer structure. In this embodiment, the multilayered base 200 amay have a base portion 201 allowing the RF device 240 to be embeddedtherein. Also, the multilayered base 200 a further comprises aninsulation layer 208 having openings therethrough disposed on the baseportion 204 close to a device-attach surface 214 of the base portion204. In this embodiment, the base portion 201 and the insulation layer208 collectively serve as a multilayer base 200 a. In this embodiment,the RF device 240 and the first conductive traces 202 a embedded in thebase portion 201. The top surface 242 a of the RF device 240 and the topsurface 202 a of the first conductive traces 202 a may be aligned to thedevice-attach surface 214 of the base portion 204. In this embodiment,the RF device 240 and the first conductive traces 202 a embedded in thebase portion 201 may be exposed within the openings of the insulationlayer 208.

FIGS. 4A to 4E are cross sections showing one exemplary embodiment of amethod for fabricating two bases 200 c and 200 d with the RF devices fora semiconductor package of the invention. In this embodiment, the methodfor fabricating bases for a semiconductor package is also called adouble-sided base fabricating process. Elements of the embodiments thatare the same or similar as those previously described with reference toFIGS. 1-3, are hereinafter not repeated for brevity. As shown in FIG.4A, a carrier 400 with conductive seed layers 402 a and 402 b on the topsurface 401 and the bottom surface 403 is provided. In one embodiment,the carrier 400 may comprise FR4 glass epoxy or stainless steel. Also,the conductive seed layers 402 a and 402 b are used as seed layers forsubsequently formed interconnection conductive traces of bases on thetop surface 401 and the bottom surface 403 of the carrier 400. In oneembodiment, the conductive seed layers 402 a and 402 b may comprisecopper.

Next, as shown in FIG. 4B, RF devices 440 a, 440 b and first conductivetraces 404 a, 404 b are formed simultaneously on the top surface 401 andthe bottom surface 403 of the carrier 400. Bottom portions of the RFdevices 440 a, 440 b and the first conductive traces 404 a and 404 bconnect to top portions of the conductive seed layers 402 a and 402 b.In one embodiment, the RF devices 440 a, 440 b and the first conductivetraces 404 a, 404 b may be formed by a plating process and ananisotropic etching process. The plating process and the anisotropicetching process are performed simultaneously on the top surface 401 andthe bottom surface 403 of the carrier 400. In one embodiment, theplating process may comprise an electrical plating process. In oneembodiment, the RF devices 440 a, 440 b and the first conductive traces404 a, 404 b may comprise copper (Cu). In one embodiment, the RF devices440 a, 440 b may serve as inductors 440 a, 440 b. In one embodiment, thewidth W1 and the minimum spacing S1 of the RF devices 440 a, 440 b orthe width W2 and the minimum spacing S2 of the first conductive traces404 a, 404 b can be precisely controlled due to the formation processes,for example, the anisotropic etching process. In this embodiment, the RFdevices 440 a, 440 b may be designed to have a width W1 which is largerthan 5 μm, and a minimum spacing S1 which is about 10-12 μm. In thisembodiment, the first conductive traces 404 a, 404 b may be designed tohave a width W2 which is larger than 5 μm, and a minimum spacing S2which is about 10-12 μm. However, it should be noted that there is nolimitation on the widths W1, W2 and minimum spacing S1, S2 of the RFdevice and the first conductive traces. For different designs, the widthS1 and S2 can be smaller than 5 μm if required. Therefore, turns of theresulted inductor 440 a, 440 b embedded in the base can be increasedover that of the conventional on-wafer inductor. Also, the resultedinductor 440 a, 440 b has a dramatically increase in thickness comparedto the conventional on-wafer inductor due to the formation processes,for example, the plating process. Further, the inductor 440 a, 440 b isformed of copper (Cu), and the resistance of the inductor can be reducedfrom that of the conventional on-wafer inductor formed of aluminum (Al).

Next, as shown in FIG. 4C, a laminating process is performed to disposea first base material layer 406 a and a second base material layer 406 bon the top surface 401 and the bottom surface 403 of the carrier 400,respectively, wherein the first base material layer 406 a and a secondbase material layer 406 b cover the RF devices 440 a, 440 b and thefirst conductive traces 404 a and 404 b, respectively. In thisembodiment, the laminating process of the first base material layer 406a and the second base material layer 406 b is performed simultaneouslyon the on the top surface 401 and the bottom surface 403 of the carrier400. In one embodiment, the first base material layer 406 a and thesecond base material layer 406 b may comprise polypropylene (PP).

Next, please refer to FIG. 4C again, wherein a drilling process isperformed to form openings (not shown) through the first base materiallayer 406 a and the second base material layer 406 b to define theformation positions of subsequently formed vias 408 a, 408 b, 448 a and448 b. In one embodiment, the drilling process may comprise a laserdrilling process, an etching drilling process, or a mechanical drillingprocess. Next, a plating process is performed to fill a conductivematerial into the openings to form vias 448 a and 448 b forinterconnecting the RF devices 440 a, 440 b to subsequent secondconductive traces 450 a and 450 b. Also, the plating process isperformed simultaneously to fill a conductive material into the openingsto form vias 408 a and 408 b for interconnecting the first conductivetraces 404 a and 404 b to subsequent second conductive traces 410 a and410 b. In this embodiment, the drilling process and the plating processare performed simultaneously on the first base material layer 406 a andthe second base material layer 406 b, respectively.

Next, please refer to FIG. 4C again, wherein a plurality of secondconductive traces 410 a, 410 b, 450 a and 450 b are respectively formedon a first surface 412 of the first base material layer 406 a and afirst surface 414 of the second base material layer 406 b. As shown inFIG. 4C, the first surface 412 of the first base material layer 406 aand the first surface 414 of the second base material layer 406 b areaway from the top surface 401 and the bottom surface 403 of the carrier400, respectively. The second conductive traces 410 a, 410 b, 450 a and450 b are formed by a plating process and an anisotropic etchingprocess. The plating process and the anisotropic etching process areperformed simultaneously on the first surface 412 of the first basematerial layer 406 a and the first surface 414 of the second basematerial layer 406 b. In one embodiment, the plating process maycomprise an electrical plating process. In one embodiment, the secondconductive traces 410 a, 410 b, 450 a and 450 b may comprise copper. Inone embodiment, the second conductive traces 410 a, 410 b, 450 a and 450b are designed to have a width W2 which is larger than 5 μm, and aminimum spacing S2 which is about 10-12 μm. However, it should be notedthat there is no limitation on the width of the conductive traces. Fordifferent designs, the width of the second conductive traces 410 a, 410b, 450 a and 450 b can be smaller than 5 μm if required. In thisembodiment, the anisotropic etching process may precisely control thewidth of the second conductive traces 410 a, 410 b, 450 a and 450 b.

Next, as shown in FIGS. 4D and 4E, the first base material layer 406 a,which comprises the RF device 440 a and the first conductive traces 404a embedded therein and second conductive traces 410 a and 450 a thereon,and the second base material layer 406 b, which comprises the RF device440 b and the first conductive traces 404 b embedded therein and thesecond conductive traces 410 b and 450 b thereon, are respectivelyseparated from the top surface 401 and the bottom surface 403 of thecarrier 400 to form a first base 200 c and a second base 200 d which areseparated from each other. Next, as shown in FIGS. 4d and 4e again, theconductive seed layers 402 a and 402 b are removed from the first base200 c and the second base 200 d, respectively.

As shown in FIGS. 4D and 4E, the RF device 440 a, 440 b and the firstconductive traces 404 a, 404 b are aligned to second surfaces 416 and418 of the of the first and second bases 200 c and 200 d, which areopposite to the first surfaces 412 and 414, respectively. In thisembodiment, the first base 200 c and the second base 200 d arefabricated simultaneously on opposite surfaces (the top surface 401 andthe bottom surface 403) by the double-sided base fabricating process.

Next, a bonding process is performed to mount a semiconductor device(e.g. the semiconductor device 300 as shown in FIG. 2) on the first base200 c/second base 200 d after the separation process through theconductive structure (e.g. the conductive structure 222 as shown in FIG.2). After the bonding process, the conductive structures are in contactwith the top surface of the RF device 440 a/440 b and the firstconductive traces 404 a, 404 b as shown in FIGS. 4D and 4E. Next, anunderfill material or the underfill (e.g. the underfill 230 as shown inFIG. 2) can be introduced into the gap between the semiconductor deviceand the first base 200 c/second base 200 d. Finally, the first base 200c/second base 200 d, the RF device 440 a/440 b, the conductive trace 404a/404 b, the second conductive traces 410 a/410 b, 450 a/450 b as shownin FIGS. 4D and 4E, the semiconductor device (e.g. the semiconductordevice 300 as shown in FIG. 2), and the conductive structure (e.g. theconductive structure 222 as shown in FIG. 2) may collectively form asemiconductor package (e.g. the semiconductor package 500 a as shown inFIG. 2).

Alternatively, two passivation or insulation layers (e.g. the insulationlayer 208 as shown in FIG. 3) having openings may optionally be formedon the second surface 416 of the first base 200 c and the second surface418 of the second base 200 d, respectively, after the separation of thefirst base 200 c and the second base 200 d as shown in FIGS. 4D and 4E.In this embodiment, terminal portions of the RF device 440 a, 440 b, andthe first conductive traces 404 a and 404 b of the first and secondbases 200 c and 200 d are exposed within the opening. Also, in thisembodiment, the first base 200 c/second base 200 d and the insulationlayer thereon collectively serve as a multilayer base. After performingthe bonding process and the underfill material/underfill introducingprocess, the first base 200 c/second base 200 d, the RF device 440 a/440b, the conductive trace 404 a/404 b, the second conductive traces 410a/410 b, 450 a/450 b as shown in FIGS. 4D and 4E, the semiconductordevice (e.g. the semiconductor device 300 as shown in FIG. 2), and theconductive structure (e.g. the conductive structure 222 as shown in FIG.2) may collectively form a semiconductor package (e.g. the semiconductorpackage 500 b as shown in FIG. 3).

Exemplary embodiments provide a semiconductor package and a method forfabricating a base for a semiconductor package. The semiconductorpackage is designed to comprise RF devices, for example, inductors,embedded in a base such as a printed circuit board (PCB). The RF devicesmay have a top surface disposed above, below, or aligned to a surface ofthe base to improve routing ability for high-density semiconductorpackages. Also, the RF devices are designed to have a width which islarger than 5 μm, and a minimum spacing which is about 10-12 μm.Further, the base may comprise a single layer structure or a multilayerstructure. Exemplary embodiments also provide a method for fabricating abase for a semiconductor package. In one embodiment, the method canfabricate two bases on two sides of a carrier simultaneously with the RFdevices, for example, inductors, embedded in the base. Further, the RFdevice may be formed by a plating process and an anisotropic etchingprocess, and the anisotropic etching process may precisely control thewidth and minimum spacing of the RF device. Therefore, turns of theinductor embedded in the base can be increased over that of theconventional on-wafer inductor. Accordingly, the size of thesemiconductor device (or die size) mounted on the base can be reduced,and the number of die-per-wafer can be increased. Also, one exemplaryembodiment of the inductor embedded in the base has a dramaticallyincrease in thickness compared to that of the conventional on-waferinductor due to the formation processes, for example, the platingprocess. Further, one exemplary embodiment of the inductor embedded in abase is formed of copper (Cu), and the resistance of the inductor can bereduced from that of the conventional on-wafer inductor formed ofaluminum (Al). Therefore, one exemplary embodiment of the inductorembedded in a base may have a higher quality factor (Q-factor) than theconventional on-wafer inductor. Alternatively, the method can fabricatea base comprising a single layer structure or a multilayer structure toimprove design capability.

While the invention has been described by way of example and in terms ofthe preferred embodiments, it is to be understood that the invention isnot limited to the disclosed embodiments. On the contrary, it isintended to cover various modifications and similar arrangements (aswould be apparent to those skilled in the art). Therefore, the scope ofthe appended claims should be accorded the broadest interpretation so asto encompass all such modifications and similar arrangements.

What is claimed is:
 1. A semiconductor package, comprising: a basehaving a device-attach surface; and a radio-frequency (RF) deviceembedded in the base, close to the device-attach surface.
 2. Thesemiconductor package as claimed in claim 1, further comprising: a firstconductive trace embedded in the base, close to the device-attachsurface; and a semiconductor device mounted on the first conductivetrace via a first conductive structure.
 3. The semiconductor package asclaimed in claim 2, further comprising: a second conductive tracedisposed on a solder-ball-attach surface of the base, wherein thesolder-ball-attach surface is opposite to the device-attach surface; anda solder-ball structure disposed on the second conductive trace.
 4. Thesemiconductor package as claimed in claim 1, wherein the RF devices havea width larger than 5 μm, and wherein the RF device has a plurality ofdevice portions, and wherein the adjacent device portions separated by aportion of the base have a minimum spacing which is about 10-12 μm. 5.The semiconductor package as claimed in claim 2, wherein the RF devicehas a top surface above, below, or aligned to the surface of the base.6. The semiconductor package as claimed in claim 2, further comprising:an insulation layer having an opening disposed on the device-attachsurface of the base, above the top surfaces of the RF device, whereinportions of the RF device is exposed within the opening.
 7. Thesemiconductor package as claimed in claim 1, wherein the firstconductive structure contacts the RF device.
 8. The semiconductorpackage as claimed in claim 1, wherein the first conductive structurecomprises a conductive pillar structure, a conductive wire structure, ora conductive paste structure.
 9. The semiconductor package as claimed inclaim 8, wherein the conductive pillar structure is composed of a metalstack comprising an under-bump metallurgy (UBM) layer, a copper layer,and a solder cap.
 10. The semiconductor package as claimed in claim 9,wherein the conductive pillar structure further comprises a conductivebuffer layer between the copper layer and the solder cap.
 11. Thesemiconductor package as claimed in claim 2, wherein the semiconductordevice comprises a die, a package, or a wafer-level package.
 12. Thesemiconductor package as claimed in claim 2, wherein the secondconductive structure comprises a copper bump or solder bump structure.13. The semiconductor package as claimed in claim 1, wherein the basecomprises a single layer structure or a multilayer structure.
 14. Asemiconductor package, comprising: a radio-frequency (RF) device, havinga bottom surface and a sidewall connected to a base; and a semiconductordevice mounted on the RF device via a conductive structure.
 15. A methodfor fabricating a base for a semiconductor package, comprising:providing a carrier with conductive seed layers on the top surface andthe bottom surface of the carrier; forming radio-frequency (RF) devicesrespectively on the conductive seed layers; laminating a first basematerial layer and a second base material layer respectively on theconductive seed layers, covering the RF devices; and separating thefirst base material layer the second base material layer, which containthe RF devices thereon, from the carrier to form a first base and asecond base.
 16. The method for fabricating a base for a semiconductorpackage as claimed in claim 15, further comprising: forming firstconductive traces on the conductive seed layers before laminating thefirst base material layer and the second base material layerrespectively on the conductive seed layers; and forming secondconductive traces respectively on first surfaces of the first basematerial layer and the second base material layer, wherein the firstsurfaces of the first base material layer and the second base materiallayer are respectively away from the top surface and the bottom surfaceof the carrier before separating the first base material layer thesecond base material layer from the carrier.
 17. The method forfabricating a base for a semiconductor package as claimed in claim 16,further comprising: performing a drilling process to form openingsthrough the first base material layer and the second base materiallayer; and performing a plating process to fill a conductive materialinto the opening to form a via for interconnecting the RF devices or thefirst conductive traces to the second conductive traces, before formingthe second conductive traces.
 18. The method for fabricating a base fora semiconductor package as claimed in claim 17, wherein the drillingprocess comprises a laser drilling process, an etching drilling process,or a mechanical drilling process, and the plating process comprises anelectrical plating process.
 19. The method for fabricating a base for asemiconductor package as claimed in claim 16, wherein the RF devices,the first conductive traces, and the second conductive traces are formedby a plating process and an anisotropic etching process.
 20. The methodfor fabricating a base for a semiconductor package as claimed in claim15, further comprising: removing conductive seed layers from the firstbase and the second base.
 21. The method for fabricating a base for asemiconductor package as claimed in claim 16, further comprising:forming insulation layers having openings respectively on the first andsecond bases, wherein portions of the RF devices and the firstconductive traces of the first and second bases are exposed within theopenings.
 22. The method for fabricating a base for a semiconductorpackage as claimed in claim 15, wherein the RF devices and the firstconductive traces of the first and second bases are aligned to thesecond surfaces of the first and second bases, and wherein the secondsurfaces are respectively opposite to the first surfaces of the firstand second bases.
 23. The method for fabricating a base for asemiconductor package as claimed in claim 15, wherein each of the RFdevices has a width larger than 5 μm, and wherein each of the RF deviceshas a plurality of device portions, and wherein the adjacent deviceportions separated by a portion of the base have a minimum spacing whichis about 10-12 μm.
 24. A method for fabricating a semiconductor package,comprising: providing a base; forming at least one radio-frequency (RF)device on the base; forming an additional insulation material on thebase; and defining patterns upon the additional insulation material,wherein the pattern is formed on the RF d